公开(公告)号：US09497842B2

公开(公告)日：2016-11-15

申请号：US14992506

申请日：2016-01-11

Applicant: GIGAPHOTON INC

Inventor： Tsukasa Hori ,  Kouji Kakizaki ,  Tatsuya Yanagida ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC: H05G2/00 ,  H01S3/223 ,  H01S3/11 ,  H01S3/102 ,  H01S3/104 ,  H01S3/16 ,  H01S3/23 ,  H01S3/00

CPC classification number: H05G2/008 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/09 ,  H01S3/102 ,  H01S3/104 ,  H01S3/1106 ,  H01S3/1611 ,  H01S3/1643 ,  H01S3/1673 ,  H01S3/2232 ,  H01S3/2308 ,  H01S3/2366 ,  H01S3/2391 ,  H05G2/003 ,  H05G2/005

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

公开(公告)号：US09373926B2

公开(公告)日：2016-06-21

申请号：US14694743

申请日：2015-04-23

Applicant: GIGAPHOTON INC.

Inventor： Hiroaki Tsushima ,  Hakaru Mizoguchi ,  Junichi Fujimoto ,  Hiroaki Nakarai ,  Natsushi Suzuki

IPC: H01S3/036 ,  F16C33/66 ,  F16C32/04 ,  H01S3/134 ,  H01S3/225 ,  H01S3/038 ,  H01S3/097 ,  H01S3/223 ,  H01S3/104 ,  F16C19/06 ,  H01S3/0971 ,  H01S3/1055

CPC classification number: H01S3/036 ,  F16C19/06 ,  F16C32/0402 ,  F16C32/0406 ,  F16C33/6696 ,  F16C2204/02 ,  F16C2204/10 ,  F16C2204/52 ,  F16C2240/40 ,  F16C2360/46 ,  H01S3/038 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/104 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/2232 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256

Abstract: There is provided a laser chamber housing a pair of discharge electrodes and a gas circulation fun, the laser chamber including: a magnetic bearing configured to support a shaft of the gas circulation fan, with the shaft being in non-contact with the magnetic bearing; and a touchdown bearing configured to operate as a bearing when the magnetic bearing is uncontrollable, the touchdown bearing being provided with solid lubricant configured of one or more of an Au plating layer, a Ni-containing plating layer, and a Cu plating layer.

Abstract translation: 提供了容纳一对放电电极和气体循环功能的激光室，所述激光室包括：支撑所述气体循环风扇的轴的磁性轴承，所述轴与所述磁性轴承不接触; 以及触控轴承，其构造为当所述磁性轴承不受控制时作为轴承进行操作，所述触地轴承设置有由Au镀层，含Ni镀层和Cu镀层中的一种或多种构成的固体润滑剂。

公开(公告)号：US09362703B2

公开(公告)日：2016-06-07

申请号：US14485355

申请日：2014-09-12

Applicant: GIGAPHOTON INC.

Inventor： Hakaru Mizoguchi ,  Takashi Suganuma ,  Hideo Hoshino ,  Osamu Wakabayashi

IPC: G01C1/00 ,  H01S3/00 ,  H05G2/00 ,  H01S3/10 ,  H01S3/13

CPC classification number: H01S3/0071 ,  H01S3/0014 ,  H01S3/10061 ,  H01S3/1305 ,  H05G2/008

Abstract: An optical device may include: an optical module disposed in a beam delivery path of a laser beam; a beam adjusting unit disposed in the beam delivery path for adjusting the beam delivery path of the laser beam; a measuring unit disposed in the beam delivery path for detecting the beam delivery path; and a control unit for controlling the beam adjusting unit based on a detection result of the beam delivery path of the laser beam detected by the measuring unit.

Abstract translation: 光学装置可以包括：设置在激光束的光束输送路径中的光学模块; 设置在所述光束传送路径中用于调节所述激光束的光束传送路径的光束调节单元; 设置在所述光束传送路径中用于检测所述光束传送路径的测量单元; 以及控制单元，用于基于由测量单元检测到的激光束的光束传递路径的检测结果来控制光束调节单元。

公开(公告)号：US10447001B2

公开(公告)日：2019-10-15

申请号：US15858219

申请日：2017-12-29

Applicant: GIGAPHOTON INC.

Inventor： Minoru Taniyama ,  Hakaru Mizoguchi ,  Osamu Wakabayashi

IPC: H01S3/038 ,  H01S3/086 ,  H01S3/104 ,  H01S3/134 ,  H01S3/08 ,  H01S3/136 ,  H01S3/0971 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23 ,  H01S3/00

Abstract: A laser unit may include a laser chamber including a pair of discharge electrodes that are opposed to each other in a first direction with an electrode gap interposed in between and are configured to provide a discharge width in a second direction, orthogonal to the first direction, smaller than the electrode gap; and an optical resonator including a first optical member and a second optical member that are opposed to each other in a third direction orthogonal to both the first direction and the second direction with the discharge electrodes interposed in between, and configured to amplify laser light generated between the discharge electrodes and output amplified laser light, the optical resonator satisfying the following expression to configure a stable resonator in the second direction: 0

公开(公告)号：US10117317B2

公开(公告)日：2018-10-30

申请号：US15832476

申请日：2017-12-05

Applicant: Gigaphoton Inc.

Inventor： Tsukasa Hori ,  Kouji Kakizaki ,  Tatsuya Yanagida ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC: H05G2/00 ,  H01S3/104 ,  H01S3/16 ,  H01S3/223 ,  H01S3/23 ,  H01S3/11 ,  H01S3/09 ,  H01S3/102 ,  H01S3/00

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

公开(公告)号：US10251255B2

公开(公告)日：2019-04-02

申请号：US16137312

申请日：2018-09-20

Applicant: Gigaphoton Inc.

Inventor： Tsukasa Hori ,  Kouji Kakizaki ,  Tatsuya Yanagida ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC: H05G2/00 ,  H01S3/23 ,  H01S3/104 ,  H01S3/16 ,  H01S3/223 ,  H01S3/11 ,  H01S3/09 ,  H01S3/00 ,  H01S3/102

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

公开(公告)号：US10306743B1

公开(公告)日：2019-05-28

申请号：US16221699

申请日：2018-12-17

Applicant: Gigaphoton Inc.

Inventor： Tsukasa Hori ,  Kouji Kakizaki ,  Tatsuya Yanagida ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC: H05G2/00 ,  H01S3/104 ,  H01S3/23 ,  H01S3/00 ,  H01S3/09 ,  H01S3/16 ,  H01S3/11 ,  H01S3/223 ,  H01S3/102

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

公开(公告)号：US09510434B2

公开(公告)日：2016-11-29

申请号：US14824270

申请日：2015-08-12

Applicant: GIGAPHOTON INC.

Inventor： Hakaru Mizoguchi ,  Yasufumi Kawasuji ,  Osamu Wakabayashi

IPC: H05G2/00 ,  G21K1/06 ,  G03F7/20

CPC classification number: H05G2/008 ,  G03F7/70033 ,  G03F7/7085 ,  G21K1/067 ,  H05G2/003 ,  H05G2/005

Abstract: Provided is an extreme ultraviolet light generating apparatus that may include: a chamber containing one or more kinds of gases; a light concentration optical system provided in an optical path of pulsed laser light outputted from a laser unit, and configured to concentrate the pulsed laser light into a concentrated beam; and an image pickup section provided at a position out of the optical path of the pulsed laser light, and configured to pick up a plasma emission image that is an image of plasma emission in the chamber. The plasma emission is caused by application of the concentrated beam to the one or more kinds of gases in the chamber.

Abstract translation: 提供一种极紫外光发生装置，其可以包括：容纳一种或多种气体的室; 光浓缩光学系统，其设置在从激光单元输出的脉冲激光的光路中，并且将脉冲激光聚焦成浓缩光束; 以及摄像部，其设置在所述脉冲激光的光路外的位置处，并且被配置为拾取作为所述室中的等离子体发射的图像的等离子体发射图像。 等离子体发射是通过将浓缩的束施加到腔室中的一种或多种气体而引起的。

公开(公告)号：US09331450B2

公开(公告)日：2016-05-03

申请号：US14663086

申请日：2015-03-19

Applicant: Gigaphoton Inc.

Inventor： Takeshi Asayama ,  Hakaru Mizoguchi ,  Kouji Kakizaki ,  Hiroaki Tsushima ,  Osamu Wakabayashi ,  Kazuya Takezawa

IPC: H01S3/097 ,  H01S3/038 ,  H01S3/225 ,  H01S3/034 ,  H01S3/08 ,  H01S3/104 ,  H01S3/036

CPC classification number: H01S3/038 ,  H01S3/03 ,  H01S3/034 ,  H01S3/036 ,  H01S3/0388 ,  H01S3/08009 ,  H01S3/09702 ,  H01S3/104 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256

Abstract: A laser apparatus according to embodiments may include a laser chamber including a laser gain medium; a power source; a first electrode to which a voltage is applied from the power source and a second electrode that is grounded, the first and second electrodes being disposed in the laser chamber; and a connector connected to the power source, and supporting the first electrode in a way that allows the first electrode to move toward a side where the second electrode is disposed.

Abstract translation: 根据实施例的激光装置可以包括包括激光增益介质的激光室; 电源; 从电源施加电压的第一电极和接地的第二电极，第一和第二电极设置在激光室中; 以及连接到所述电源的连接器，并且以允许所述第一电极向所述第二电极设置的一侧移动的方式支撑所述第一电极。

公开(公告)号：US08698114B2

公开(公告)日：2014-04-15

申请号：US13759970

申请日：2013-02-05

Applicant: Gigaphoton Inc.

Inventor： Masato Moriya ,  Hideo Hoshino ,  Hakaru Mizoguchi ,  Osamu Wakabayashi

IPC: G21K5/00

CPC classification number: H01S3/10 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/034 ,  H01S3/1061 ,  H01S3/1307 ,  H01S3/136 ,  H01S3/2232 ,  H01S3/2316 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller.

Abstract translation: EUV光源装置适当地补偿由热量改变的激光束的波前。 在放大激光束的放大系统中提供波前补偿器和传感器。 传感器检测并输出激光束的角度（方向）和其波前的曲率的变化。 波前补偿控制器根据传感器的测量结果向波前补偿器输出信号。 波前补偿器根据波前补偿控制器的指令将激光束的波前校正到预定的波前。