Invention Grant
- Patent Title: Source-collector device, lithographic apparatus, and device manufacturing method
- Patent Title (中): 源极集电极器件,光刻设备和器件制造方法
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Application No.: US14372950Application Date: 2013-01-10
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Publication No.: US09411238B2Publication Date: 2016-08-09
- Inventor: Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Martinus Cornelis Maria Verhagen , Olav Waldemar Vladimir Frijns , Vladimir Mihailovitch Krivtsun , Gerardus Hubertus Petrus Maria Swinkels , Michel Riepen , Hendrikus Gijsbertus Schimmel , Viacheslav Medvedev
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2013/050406 WO 20130110
- International Announcement: WO2013/107686 WO 20130725
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G03F7/20 ; G21K1/06

Abstract:
A source-collector device includes a target unit having a target surface of plasma-forming material and a laser unit to generate a beam of radiation directed onto the target surface to form a plasma from said plasma-forming material. A contaminant trap is provided to reduce propagation of particulate contaminants generated by the plasma. A radiation collector includes a one or more grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom, and a filter is configured to attenuate at least one wavelength range of the beam.
Public/Granted literature
- US20140375974A1 SOURCE-COLLECTOR DEVICE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2014-12-25
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