Invention Grant
- Patent Title: Polymerized film forming method
- Patent Title (中): 聚合成膜法
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Application No.: US14619375Application Date: 2015-02-11
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Publication No.: US09422452B2Publication Date: 2016-08-23
- Inventor: Tatsuya Yamaguchi , Yoshinori Morisada
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Nath, Goldberg & Meyer
- Agent Jerald L. Meyer
- Priority: JP2014-028628 20140218
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C09D183/14 ; B05D1/34 ; B05D1/00 ; C08G77/54
Abstract:
A polymerized film forming method for forming a polymerized film on a target surface of a workpiece using a first raw material gas which contains a first monomer and a second raw material gas which contains a second monomer differing from the first monomer includes: supplying the first raw material gas wherein difunctional non-aromatic amine having a hydrolyzable group is used for the first monomer; and supplying the second raw material gas wherein difunctional acid anhydride is used for the second monomer.
Public/Granted literature
- US20150232702A1 POLYMERIZED FILM FORMING METHOD AND POLYMERIZED FILM FORMING APPARATUS Public/Granted day:2015-08-20
Information query
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