发明授权
US09423687B2 Mask plate, method for fabricating array substrate using the same, and array substrate
有权
掩模板,使用其制造阵列基板的方法和阵列基板
- 专利标题: Mask plate, method for fabricating array substrate using the same, and array substrate
- 专利标题(中): 掩模板,使用其制造阵列基板的方法和阵列基板
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申请号: US13974223申请日: 2013-08-23
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公开(公告)号: US09423687B2公开(公告)日: 2016-08-23
- 发明人: Yanping Liao , Jing Lv , Xibin Shao , Daekeun Yoon , Ying Wang , Zhenyu Zhang
- 申请人: BOE Technology Group Co., Ltd. , Beijing BOE Display Technology Co., Ltd.
- 申请人地址: CN Beijing CN Beijing
- 专利权人: BOE TECHNOLOGY GROUP CO., LTD.,BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
- 当前专利权人: BOE TECHNOLOGY GROUP CO., LTD.,BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
- 当前专利权人地址: CN Beijing CN Beijing
- 优先权: CN201210306678 20120824
- 主分类号: G03C5/06
- IPC分类号: G03C5/06 ; G03F7/00 ; G03F1/00
摘要:
Embodiments of the invention provide a mask plate, a method for fabricating an array substrate using the mask plate, and an array substrate. The mask plate is used for fabricating the array substrate by a stitching exposure. The mask plate comprises 2n+1 mask patterns successively arranged and parallel to each other, where n is any natural number, each mask pattern includes a light-shielding pattern corresponding to a portion of a data signal line on the array substrate. The light-shielding patterns of two adjacent mask patterns are discontinuous, and the portions on both sides of the light-shielding pattern of the mask pattern located in the middle of the mask plate are asymmetric.
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