发明授权
- 专利标题: Method and apparatus for generating radiation
- 专利标题(中): 用于产生辐射的方法和装置
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申请号: US14439476申请日: 2013-10-03
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公开(公告)号: US09442380B2公开(公告)日: 2016-09-13
- 发明人: Ramin Badie , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Antonius Theodorus Wilhelmus Kempen , Andrei Mikhailovich Yakunin , Hendrikus Robertus Marie Van Greevenbroek , Koen Gerhardus Winkels
- 申请人: ASML Netherlands B.V.
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 国际申请: PCT/EP2013/070616 WO 20131003
- 国际公布: WO2014/067741 WO 20140508
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; H05G2/00
摘要:
A radiation source (e.g., LPP—laser produced plasma source) for generation of extreme UV (EUV) radiation has at least two fuel particle streams having different trajectories. Each stream is directed to cross the path of an excitation (laser) beam focused at a plasma formation region, but the trajectories are spaced apart at the plasma formation region, and the streams phased, so that only one stream has a fuel particle in the plasma formation region at any time, and so that when a fuel particle from one stream is generating plasma and EUV radiation at the plasma generation region, other fuel particles are sufficiently spaced so as to be substantially unaffected by the plasma. The arrangement permits potential doubling of the radiation intensity achievable for a particular fuel particle size.
公开/授权文献
- US20150268559A1 Method and Apparatus for Generating Radiation 公开/授权日:2015-09-24
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