Invention Grant
- Patent Title: Method and apparatus for generating radiation
- Patent Title (中): 用于产生辐射的方法和装置
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Application No.: US14439476Application Date: 2013-10-03
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Publication No.: US09442380B2Publication Date: 2016-09-13
- Inventor: Ramin Badie , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Antonius Theodorus Wilhelmus Kempen , Andrei Mikhailovich Yakunin , Hendrikus Robertus Marie Van Greevenbroek , Koen Gerhardus Winkels
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- International Application: PCT/EP2013/070616 WO 20131003
- International Announcement: WO2014/067741 WO 20140508
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H05G2/00

Abstract:
A radiation source (e.g., LPP—laser produced plasma source) for generation of extreme UV (EUV) radiation has at least two fuel particle streams having different trajectories. Each stream is directed to cross the path of an excitation (laser) beam focused at a plasma formation region, but the trajectories are spaced apart at the plasma formation region, and the streams phased, so that only one stream has a fuel particle in the plasma formation region at any time, and so that when a fuel particle from one stream is generating plasma and EUV radiation at the plasma generation region, other fuel particles are sufficiently spaced so as to be substantially unaffected by the plasma. The arrangement permits potential doubling of the radiation intensity achievable for a particular fuel particle size.
Public/Granted literature
- US20150268559A1 Method and Apparatus for Generating Radiation Public/Granted day:2015-09-24
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