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14 条记录 (耗时 0.017 秒)

    Radiation source and lithographic apparatus
    2.
    发明授权
    Radiation source and lithographic apparatus 有权
    辐射源和光刻设备

    公开(公告)号：US09510432B2

    公开(公告)日：2016-11-29

    申请号：US14383359

    申请日：2013-02-07

    申请人： ASML Netherlands B.V.

    发明人： Antonius Theodorus Wilhelmus Kempen ,  Johan Frederik Dijksman ,  Wilbert Jan Mestrom

    IPC分类号： H05G2/00 ,  G03F7/20 ,  B05B17/06

    CPC分类号： H05G2/006 ,  B05B17/0653 ,  G03F7/70033 ,  G03F7/70058 ,  G03F7/7085 ,  G03F7/709 ,  G03F7/70916

    摘要： The present invention provides a method of monitoring the operation of a radiation source fuel droplet stream generator comprising a fuel-containing capillary and a piezo-electric actuator (500). The method comprises analyzing the resonance frequency spectrum of a system comprising the fuel-containing capillary and the piezo-electric actuator in particular to look for changes in the resonance frequencies of the acoustic system which may be indicative of a change in the properties of the system requiring investigation.

    摘要翻译： 本发明提供一种监测包括含燃料毛细管和压电致动器（500）的辐射源燃料液滴流发生器的操作的方法。 该方法包括分析包括含燃料的毛细管和压电致动器的系统的共振频谱，以寻找声学系统的共振频率的变化，其可以指示系统的性质的变化 需要调查。

    Radiation source
    4.
    发明授权
    Radiation source 有权

    公开(公告)号：US09860966B2

    公开(公告)日：2018-01-02

    申请号：US14400773

    申请日：2013-04-29

    申请人： ASML Netherlands B.V.

    发明人： Jan Bernard Plechelmus Van Schoot ,  Antonius Theodorus Wilhelmus Kempen ,  Hermanus Kreuwel ,  Andrei Mikhailovich Yakunin

    IPC分类号： G03B27/54 ,  H05G2/00 ,  G03F7/20

    CPC分类号： H05G2/008 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/006

    摘要： A radiation source for generating EUV radiation includes a laser configured to fire laser pulses at a target area to which is supplied a stream of fuel droplets, which may be tin droplets that emit EUV radiation when excited by the laser beam. The EUV radiation is collected by a collector. The tin droplets may be pre-conditioned by a laser pre-pulse before the main laser pulse to change the shape of the droplets so that the droplets are in an optimum condition for receiving the main laser pulse. Embodiments of the invention take into account the effect of the vaporization of one fuel droplet on succeeding droplets and allow the timing of the main and/or pre-pulse to be adjusted to take into account any delay in arrival of the subsequent droplet or oscillations in the shape of the subsequent droplet which may be caused by vaporization of the preceding droplet.

    Radiation Source and Lithographic Apparatus
    6.
    发明申请
    Radiation Source and Lithographic Apparatus 有权
    辐射源和平版印刷设备

    公开(公告)号：US20150055106A1

    公开(公告)日：2015-02-26

    申请号：US14377586

    申请日：2013-01-03

    申请人： ASML Netherlands B.V.

    发明人： Johan Frederik Dijksman ,  Johannes Hultermans ,  Antonius Theodorus Wilhelmus Kempen ,  Ramin Badie

    IPC分类号： H05G2/00 ,  G03F7/20

    CPC分类号： H05G2/006 ,  G03F7/70033 ,  G03F7/70908 ,  G03F7/70916 ,  H05G2/005

    摘要： The present invention provides methods and apparatus for facilitating the start up of a fuel droplet stream generator. During a start-up phase the fuel droplet stream generator is positioned so that the fuel droplets re emitted downwardly whereby gravity assists in the establishment of the stream. The droplets are monitored using a visualization system and once the stream is determined to have the desired characteristics the stream generator is moved to a second position of steady state use in which the droplet stream is emitted in a horizontal direction.

    摘要翻译： 本发明提供了一种便于启动燃料液滴流发生器的方法和装置。 在起动阶段期间，燃料液滴流发生器被定位成使得燃料液滴向下发射，由此重力有助于流的建立。 使用可视化系统监测液滴，并且一旦流被确定为具有期望的特性，则流发生器被移动到液晶流在水平方向上发射的稳态使用的第二位置。

    Method and apparatus for generating radiation
    8.
    发明授权
    Method and apparatus for generating radiation 有权
    用于产生辐射的方法和装置

    公开(公告)号：US09442380B2

    公开(公告)日：2016-09-13

    申请号：US14439476

    申请日：2013-10-03

    申请人： ASML Netherlands B.V.

    发明人： Ramin Badie ,  Vadim Yevgenyevich Banine ,  Johan Frederik Dijksman ,  Antonius Theodorus Wilhelmus Kempen ,  Andrei Mikhailovich Yakunin ,  Hendrikus Robertus Marie Van Greevenbroek ,  Koen Gerhardus Winkels

    IPC分类号： G03F7/20 ,  H05G2/00

    CPC分类号： G03F7/70033 ,  H05G2/003 ,  H05G2/006 ,  H05G2/008

    摘要： A radiation source (e.g., LPP—laser produced plasma source) for generation of extreme UV (EUV) radiation has at least two fuel particle streams having different trajectories. Each stream is directed to cross the path of an excitation (laser) beam focused at a plasma formation region, but the trajectories are spaced apart at the plasma formation region, and the streams phased, so that only one stream has a fuel particle in the plasma formation region at any time, and so that when a fuel particle from one stream is generating plasma and EUV radiation at the plasma generation region, other fuel particles are sufficiently spaced so as to be substantially unaffected by the plasma. The arrangement permits potential doubling of the radiation intensity achievable for a particular fuel particle size.

    摘要翻译： 用于产生极端UV（EUV）辐射的辐射源（例如，LPP激光产生的等离子体源）具有至少两个具有不同轨迹的燃料粒子流。 每个流被引导以跨过等离子体形成区域聚焦的激发（激光）束的路径，但是轨迹在等离子体形成区域处被间隔开，并且流被相位化，使得仅一条流在 等离子体形成区域，并且使得当来自一个流的燃料粒子在等离子体产生区域产生等离子体和EUV辐射时，其它燃料颗粒被充分间隔开，以致基本上不受等离子体的影响。 该布置允许对于特定燃料粒子尺寸可实现的辐射强度的潜在加倍。

    RADIATION SOURCE
    9.
    发明申请
    RADIATION SOURCE 有权
    辐射源

    公开(公告)号：US20150146182A1

    公开(公告)日：2015-05-28

    申请号：US14400773

    申请日：2013-04-29

    申请人： ASML Netherlands B.V.

    发明人： Jan Bernard Plechelmus Van Schoot ,  Antonius Theodorus Wilhelmus Kempen ,  Hermanus Kreuwel ,  Andrei Mikhailovich Yakunin

    IPC分类号： H05G2/00 ,  G03F7/20

    CPC分类号： H05G2/008 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/006

    摘要： A radiation source for generating EUV radiation includes a laser configured to fire laser pulses at a target area to which is supplied a stream of fuel droplets, which may be tin droplets that emit EUV radiation when excited by the laser beam. The EUV radiation is collected by a collector. The tin droplets may be pre-conditioned by a laser pre-pulse before the main laser pulse to change the shape of the droplets so that the droplets are in an optimum condition for receiving the main laser pulse. Embodiments of the invention take into account the effect of the vaporization of one fuel droplet on succeeding droplets and allow the timing of the main and/or pre-pulse to be adjusted to take into account any delay in arrival of the subsequent droplet or oscillations in the shape of the subsequent droplet which may be caused by vaporization of the preceding droplet.

    摘要翻译： 用于产生EUV辐射的辐射源包括激光器，其被配置为在被供应燃料液滴流的目标区域发射激光脉冲，所述燃料液滴流可以是当被激光束激发时发射EUV辐射的锡液滴。 EUV辐射由收集器收集。 锡液滴可以在主激光脉冲之前通过激光预脉冲进行预调节，以改变液滴的形状，使得液滴处于用于接收主激光脉冲的最佳状态。 本发明的实施例考虑了一个燃料液滴对随后的液滴的蒸发的影响，并允许调整主和/或预脉冲的定时，以考虑随后的液滴或振荡到达的任何延迟 可能由先前液滴汽化引起的后续液滴的形状。