Method of fabricating integrated circuits, integrated circuit component mask layout set, and component photomask set
Abstract:
A method of fabricating integrated circuits includes the steps of: a) with reference to a physical design of a hardware unit, preparing an integrated circuit component mask layout set associated with component photomasks suitable for fabricating an array of the hardware units on a wafer; b) preparing the component photomasks with reference to the integrated circuit component mask layout set; c) forming the array of the hardware units and interconnections between adjacent hardware units on the wafer using the component photomasks prepared in step b) ; and d) cutting the wafer along selected ones of the scribe lines so as to form a plurality of integrated circuit dies. Each of the integrated circuit dies is independently selected from a single-type including only one of the hardware units, and a multi-type including a plurality of the hardware units that are interconnected electrically via uncut ones of the conductive paths.
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