Invention Grant
- Patent Title: Method for adjusting compensating optical system and compensating optical system
- Patent Title (中): 调整补偿光学系统和补偿光学系统的方法
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Application No.: US14404997Application Date: 2013-04-01
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Publication No.: US09448120B2Publication Date: 2016-09-20
- Inventor: Hongxin Huang
- Applicant: HAMAMATSU PHOTONICS K.K.
- Applicant Address: JP Hamamatsu-shi, Shizuoka
- Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee Address: JP Hamamatsu-shi, Shizuoka
- Agency: Drinker Biddle & Reath LLP
- Priority: JP2012-127222 20120604
- International Application: PCT/JP2013/059958 WO 20130401
- International Announcement: WO2013/183341 WO 20131212
- Main IPC: G01J9/00
- IPC: G01J9/00 ; G01M11/02 ; A61B3/14 ; G02F1/13

Abstract:
A positional deviation between a phase distribution in a wavefront sensor and a compensation phase pattern in a wavefront modulator is corrected in a short time and with high accuracy by a method including a first step of causing the wavefront modulator to display a singularity generation pattern, a second step of measuring in the sensor an adjustment wavefront shape when an optical image modulated by the singularity generation pattern enters the wavefront sensor, a third step of detecting a position of a singularity in the adjustment wavefront shape from a measurement result in the sensor, and a fourth step of adjusting a positional deviation between a wavefront shape measured in the wavefront sensor and a compensation pattern displayed on the wavefront modulator based on a positional deviation of the position of the singularity.
Public/Granted literature
- US20150146196A1 METHOD FOR ADJUSTING COMPENSATING OPTICAL SYSTEM AND COMPENSATING OPTICAL SYSTEM Public/Granted day:2015-05-28
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