Invention Grant
- Patent Title: Processing systems and methods for halide scavenging
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Application No.: US14703299Application Date: 2015-05-04
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Publication No.: US09449850B2Publication Date: 2016-09-20
- Inventor: Anchuan Wang , Xinglong Chen , Zihui Li , Hiroshi Hamana , Zhijun Chen , Ching-Mei Hsu , Jiayin Huang , Nitin K. Ingle , Dmitry Lubomirsky , Shankar Venkataraman , Randhir Thakur
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: H01L21/324
- IPC: H01L21/324 ; H01L21/3065 ; H01L21/306 ; H01L21/311
Abstract:
Systems, chambers, and processes are provided for controlling process defects caused by moisture contamination. The systems may provide configurations for chambers to perform multiple operations in a vacuum or controlled environment. The chambers may include configurations to provide additional processing capabilities in combination chamber designs. The methods may provide for the limiting, prevention, and correction of aging defects that may be caused as a result of etching processes performed by system tools.
Public/Granted literature
- US20150235865A1 PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING Public/Granted day:2015-08-20
Information query
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