Invention Grant
- Patent Title: Semiconductor devices and methods of forming the same
- Patent Title (中): 半导体器件及其形成方法
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Application No.: US14829650Application Date: 2015-08-19
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Publication No.: US09449970B2Publication Date: 2016-09-20
- Inventor: Jung-Ho Do , Sanghoon Baek , Sunyoung Park , Moo-Gyu Bae , Taejoong Song
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do
- Agency: Muir Patent Law, PLLC
- Priority: KR10-2014-0178630 20141211
- Main IPC: H01L29/76
- IPC: H01L29/76 ; H01L29/94 ; H01L27/088 ; H01L27/02 ; H01L29/06 ; H01L27/118

Abstract:
A semiconductor device includes first and second gate structures extending in a first direction and spaced apart from each other in a second direction intersecting the first direction, a third gate structure extending in the first direction and provided between the first and second gate structures, a first contact connected to the first gate structure and having a first width in the second direction, a second contact connected to the second gate structure and having a second width in the second direction, and a third contact connected to the third gate structure and having a third width in the second direction. The first, second, and third contacts may be aligned with each other in the second direction to constitute one row. The first and second widths may be greater than the third width.
Public/Granted literature
- US20160056153A1 SEMICONDUCTOR DEVICES AND METHODS OF FORMING THE SAME Public/Granted day:2016-02-25
Information query
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