Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
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Application No.: US13957819Application Date: 2013-08-02
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Publication No.: US09449996B2Publication Date: 2016-09-20
- Inventor: Shunpei Yamazaki , Hiroyuki Miyake , Hideaki Shishido , Jun Koyama , Daisuke Matsubayashi , Keisuke Murayama
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Fish & Richardson P.C.
- Priority: JP2012-173349 20120803; JP2012-178941 20120810; JP2012-188093 20120828
- Main IPC: H01L31/00
- IPC: H01L31/00 ; H01L27/12 ; G02F1/1362 ; H01L27/32 ; G02F1/1339 ; G02F1/1345 ; G02F1/1343

Abstract:
To provide a semiconductor device including a capacitor whose charge capacity is increased without reducing the aperture ratio. The semiconductor device includes a transistor including a light-transmitting semiconductor film, a capacitor where a dielectric film is provided between a pair of electrodes, an insulating film provided over the light-transmitting semiconductor film, and a light-transmitting conductive film provided over the insulating film. In the capacitor, a metal oxide film containing at least indium (In) or zinc (Zn) and formed on the same surface as the light-transmitting semiconductor film in the transistor serves as one electrode, the light-transmitting conductive film serves as the other electrode, and the insulating film provided over the light-transmitting semiconductor film serves as the dielectric film.
Public/Granted literature
- US20140034954A1 SEMICONDUCTOR DEVICE Public/Granted day:2014-02-06
Information query
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