Invention Grant
- Patent Title: Photoelectric conversion device and manufacturing method thereof
- Patent Title (中): 光电转换装置及其制造方法
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Application No.: US14514552Application Date: 2014-10-15
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Publication No.: US09450132B2Publication Date: 2016-09-20
- Inventor: Sho Kato , Yoshikazu Hiura , Akihisa Shimomura , Takashi Ohtsuki , Satoshi Toriumi , Yasuyuki Arai
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Fish & Richardson P.C.
- Priority: JP2008-243695 20080924
- Main IPC: H01L31/077
- IPC: H01L31/077 ; H01L31/20 ; H01L21/02 ; H01L31/036 ; H01L31/0376 ; H01L31/075 ; H01L31/18

Abstract:
An object is to increase conversion efficiency of a photoelectric conversion device without increase in the manufacturing steps. The photoelectric conversion device includes a first semiconductor layer formed using a single crystal semiconductor having one conductivity type which is formed over a supporting substrate, a buffer layer including a single crystal region and an amorphous region, a second semiconductor layer which includes a single crystal region and an amorphous region and is provided over the butler layer, and a third semiconductor layer having a conductivity type opposite to the one conductivity type, which is provided over the second semiconductor layer. A proportion of the single crystal region is higher than that of the amorphous region on the first semiconductor layer side in the second semiconductor layer, and the proportion of the amorphous region is higher than that of the single crystal region on the third semiconductor layer side.
Public/Granted literature
- US20150053264A1 PHOTOELECTRIC CONVERSION DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2015-02-26
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