Invention Grant
- Patent Title: Devices and methods for analyzing layers of samples
- Patent Title (中): 用于分析样品层的设备和方法
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Application No.: US14805221Application Date: 2015-07-21
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Publication No.: US09453764B2Publication Date: 2016-09-27
- Inventor: Rudolf J. Hofmeister , Donald A. Ice , Scott W. Tandy
- Applicant: H2Optx Inc.
- Applicant Address: US CA San Jose
- Assignee: H2Optx Inc.
- Current Assignee: H2Optx Inc.
- Current Assignee Address: US CA San Jose
- Agency: Maschoff Brennan
- Main IPC: G01N21/25
- IPC: G01N21/25 ; G01J3/42 ; G01J3/44 ; G01J3/06 ; G01J3/10 ; B01D46/00 ; B01D46/42 ; G01N1/06 ; G01N33/15 ; G01N21/01 ; G01N23/00 ; G01N35/10 ; G01N21/3504 ; G01J3/00 ; G01N21/33 ; G01N21/3577 ; G01N21/65

Abstract:
The present disclosure generally relates to systems, devices and methods for analyzing and processing samples or analytes. In one example configuration, a method of analyzing an analyte includes shaving a first layer of a plurality of layers of an analyte to expose a first surface of an analyte. The method includes positioning the first surface of the analyte over a window of a hyperspectral analyzation subassembly. The method further includes scanning the first surface of the analyte by the hyperspectral analyzation subassembly to obtain information regarding the analyte proximate the first surface. Other systems, devices and methods are disclosed herein.
Public/Granted literature
- US20160216199A1 DEVICES AND METHODS FOR ANALYZING LAYERS OF SAMPLES Public/Granted day:2016-07-28
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