Invention Grant
- Patent Title: Method of manufacturing of amorphous silicon thin film transistor liquid crystal display device
- Patent Title (中): 非晶硅薄膜晶体管液晶显示装置的制造方法
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Application No.: US14140220Application Date: 2013-12-24
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Publication No.: US09454049B2Publication Date: 2016-09-27
- Inventor: Dong-Gyu Kim
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin, Gyeonggi-Do
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Yongin, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2002-0029664 20020528
- Main IPC: G02F1/1343
- IPC: G02F1/1343 ; G02F1/1345 ; G09G3/36 ; G11C19/28 ; H01L29/66 ; G02F1/1362

Abstract:
In an amorphous silicon thin film transistor-liquid crystal display device and a method of manufacturing the same, gate patterns including a gate line and a gate electrode are formed on an insulation substrate having a display region and a driving circuit region on which a plurality of shift resistors are formed. A gate insulating film, active layer patterns and data patterns including source/drain electrodes are formed successively on the substrate. A passivation layer on the substrate has a first contact hole exposing a drain electrode of the display region and second and third contact holes respectively exposing a gate electrode and source/drain electrode of a first transistor of each of the shift resistors. Electrode patterns on the passivation layer include a first electrode connected to the drain electrode of the display region through the first contact hole and a second electrode connecting the gate electrode to the source/drain electrode of the first transistor through the second and third contact holes. The gate driving circuit including the shift resistors and the wirings are integrated on the insulating substrate without an additional process, thereby simplifying the manufacturing process.
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