Invention Grant
- Patent Title: Fabrication method of packaging substrate
- Patent Title (中): 包装基材的制造方法
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Application No.: US14866106Application Date: 2015-09-25
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Publication No.: US09455159B2Publication Date: 2016-09-27
- Inventor: Wei-Ping Wang , Pang-Chun Lin , Chin-Chih Hsiao , Kuan-I Cheng , Cheng-Wen Chiu
- Applicant: Siliconware Precision Industries Co., Ltd.
- Applicant Address: TW Taichung
- Assignee: Siliconware Precision Industries Co., Ltd.
- Current Assignee: Siliconware Precision Industries Co., Ltd.
- Current Assignee Address: TW Taichung
- Agency: Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- Agent Peter F. Corless; Steven M. Jensen
- Priority: TW100140495A 20111107
- Main IPC: H01L21/48
- IPC: H01L21/48 ; H01L23/498 ; H01L21/56 ; H01L23/31 ; H01L23/00

Abstract:
A method for fabricating a packaging substrate includes: providing a carrier having a first metal layer and a second metal layer formed on the first metal layer; forming a first circuit layer on the second metal layer and forming a separating portion on an edge of the second metal layer such that the separating portion is spaced from the first circuit layer; forming a dielectric layer on the second metal layer and the first circuit layer such that the first circuit layer and the separating portion are embedded in the dielectric layer and portions of the dielectric layer are formed between the first circuit layer and the separating portion; forming a second circuit layer on the dielectric layer; and applying forces on the separating portion so as to remove the first metal layer and the carrier, thereby maintaining the integrity of the first circuit layer.
Public/Granted literature
- US20160013074A1 FABRICATION METHOD OF PACKAGING SUBSTRATE Public/Granted day:2016-01-14
Information query
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