Invention Grant
US09459522B2 Exposure mask and method of fabricating display panel using the same
有权
曝光掩模和使用其制造显示面板的方法
- Patent Title: Exposure mask and method of fabricating display panel using the same
- Patent Title (中): 曝光掩模和使用其制造显示面板的方法
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Application No.: US14226558Application Date: 2014-03-26
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Publication No.: US09459522B2Publication Date: 2016-10-04
- Inventor: Jungi Kim , Taegyun Kim , Jin-Su Byun
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2013-0117470 20131001
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F1/38 ; G03F1/00 ; G03F7/00
Abstract:
An exposure mask for forming a pattern in a photosensitive material includes a mask substrate which is disposed facing the photosensitive material; a body portion on the mask substrate and corresponding to a shape of the pattern at a distance furthest from the exposure mask; and a plurality of branch portions on the mask substrate and each extending outward from an outer edge of the body portion, in a plan view. The pattern comprises a contact hole of a display device.
Public/Granted literature
- US20150093687A1 EXPOSURE MASK AND METHOD OF FABRICATING DISPLAY PANEL USING THE SAME Public/Granted day:2015-04-02
Information query
IPC分类:
