Invention Grant
- Patent Title: Radiation source and lithographic apparatus
- Patent Title (中): 辐射源和光刻设备
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Application No.: US14377586Application Date: 2013-01-03
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Publication No.: US09462667B2Publication Date: 2016-10-04
- Inventor: Johan Frederik Dijksman , Ronald Johannes Hultermans , Antonius Theodorus Wilhelmus Kempen , Ramin Badie
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- International Application: PCT/EP2013/050055 WO 20130103
- International Announcement: WO2013/117355 WO 20130815
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/54 ; H05G2/00 ; G03F7/20
Abstract:
The present invention provides methods and apparatus for facilitating the start up of a fuel droplet stream generator. During a start-up phase the fuel droplet stream generator is positioned so that the fuel droplets re emitted downwardly whereby gravity assists in the establishment of the stream. The droplets are monitored using a visualization system and once the stream is determined to have the desired characteristics the stream generator is moved to a second position of steady state use in which the droplet stream is emitted in a horizontal direction.
Public/Granted literature
- US20150055106A1 Radiation Source and Lithographic Apparatus Public/Granted day:2015-02-26
Information query
