Invention Grant
- Patent Title: Focus monitoring method using asymmetry embedded imaging target
- Patent Title (中): 使用不对称嵌入成像目标的聚焦监测方法
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Application No.: US13908623Application Date: 2013-06-03
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Publication No.: US09466100B2Publication Date: 2016-10-11
- Inventor: DongSub Choi , Bill Pierson , David Tien , James Manka , Dongsuk Park
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: G06K9/00
- IPC: G06K9/00 ; G03F1/00 ; G06T7/00
Abstract:
A method for monitoring mask focus includes measuring profile asymmetries in a target feature including sub-resolution assist features and deriving a focus response based on a known correlation between the profile and focus of a corresponding mask. A computer system in a lithographic process may adjust mask focus based on such derived information to conform to a desired fabrication process.
Public/Granted literature
- US20130336572A1 Focus Monitoring Method Using Asymmetry Embedded Imaging Target Public/Granted day:2013-12-19
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