Invention Grant
- Patent Title: Support, lithographic apparatus and device manufacturing method
- Patent Title (中): 支持，光刻设备和器件制造方法
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Application No.: US13686186Application Date: 2012-11-27
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Publication No.: US09470969B2Publication Date: 2016-10-18
- Inventor: Theodorus Petrus Maria Cadee , Koen Jacobus Johannes Maria Zaal , Harmeet Singh
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03B27/58
- IPC: G03B27/58 ; H01L21/683 ; G03F7/20
Abstract:
A support for an object, e.g., a semiconductor substrate, includes a main body having a surface configured and arranged to have a plurality of projections. Each of the projections has an associated electrostatic actuator for displacing a free end of the associated projection relative to the main body at least in a direction in a plane parallel to a main surface of the object.
Public/Granted literature
- US20130164688A1 Support, Lithographic Apparatus and Device Manufacturing Method Public/Granted day:2013-06-27
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