发明授权
- 专利标题： Support, lithographic apparatus and device manufacturing method
- 专利标题（中）： 支持，光刻设备和器件制造方法
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申请号： US13686186申请日： 2012-11-27
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公开(公告)号： US09470969B2公开(公告)日： 2016-10-18
- 发明人: Theodorus Petrus Maria Cadee , Koen Jacobus Johannes Maria Zaal , Harmeet Singh
- 申请人： ASML Netherlands B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 主分类号： G03B27/58
- IPC分类号： G03B27/58 ; H01L21/683 ; G03F7/20
摘要：
A support for an object, e.g., a semiconductor substrate, includes a main body having a surface configured and arranged to have a plurality of projections. Each of the projections has an associated electrostatic actuator for displacing a free end of the associated projection relative to the main body at least in a direction in a plane parallel to a main surface of the object.
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