Invention Grant
- Patent Title: Small production device and production system using the same
- Patent Title (中): 小型生产设备和生产系统使用相同
-
Application No.: US14768352Application Date: 2014-02-17
-
Publication No.: US09478452B2Publication Date: 2016-10-25
- Inventor: Shiro Hara , Hitoshi Maekawa , Shizuka Nakano
- Applicant: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Applicant Address: JP Tokyo
- Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Current Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Current Assignee Address: JP Tokyo
- Agency: Staas & Halsey LLP
- Priority: JP2013-030596 20130220
- International Application: PCT/JP2014/053617 WO 20140217
- International Announcement: WO2014/129421 WO 20140828
- Main IPC: H01L21/677
- IPC: H01L21/677 ; H01L21/67

Abstract:
A production system to facilitate the commonization of front chambers among a plurality of production devices that are different in the kind of a process to be performed for a processing substrate.Control units are provided separately in a processing chamber and a front chamber of a small production device. When the processing-chamber control unit outputs a load request signal, the front-chamber control unit loads a processing substrate to the processing chamber, and outputs a load acknowledgment signal. When the load acknowledgment signal is input, the processing-chamber control unit performs a process for the processing substrate, and outputs an unload request signal after the completion of the process. When the unload request signal is input, the front-chamber control unit unloads the processing substrate, and outputs an unload acknowledgment signal. When the unload acknowledgment signal is input, the processing chamber starts the preparation of the next process.
Public/Granted literature
- US20150380289A1 SMALL PRODUCTION DEVICE AND PRODUCTION SYSTEM USING THE SAME Public/Granted day:2015-12-31
Information query
IPC分类: