Invention Grant
- Patent Title: Nonvolatile memory device and method for manufacturing the same
- Patent Title (中): 非易失性存储器件及其制造方法
-
Application No.: US14559914Application Date: 2014-12-03
-
Publication No.: US09478584B2Publication Date: 2016-10-25
- Inventor: Yoshio Kawashima , Yukio Hayakawa , Atsushi Himeno
- Applicant: Panasonic Intellectual Property Management Co., Ltd.
- Applicant Address: JP Osaka
- Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Current Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2013-259522 20131216
- Main IPC: H01L45/00
- IPC: H01L45/00 ; H01L27/24

Abstract:
A nonvolatile memory device includes an insulating layer, oxygen diffusion prevention layers disposed on the insulating layer, a plurality of contact plugs, each of the plurality of the contact plugs penetrating through each of the plurality of the oxygen diffusion prevention layers and at least a part of the insulating layer, and a plurality of resistance-variable elements, each of the plurality of the resistance-variable elements covering each of the plurality of the contact plugs exposed on surfaces of the oxygen diffusion prevention layers and being electrically connected to each of the plurality of the contact plugs Each of the oxygen diffusion prevention layers is provided only between the insulating layer and each of the plurality of the resistance-variable elements to correspond to each of the plurality of the contact plugs arranged for each of the plurality of the resistance-variable elements.
Public/Granted literature
- US20150171142A1 NONVOLATILE MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2015-06-18
Information query
IPC分类: