Invention Grant
US09478667B2 Thin film transistor substrate, method of manufacturing the same, and liquid crystal display panel having the same
有权
薄膜晶体管基板及其制造方法以及具有该薄膜晶体管基板的液晶显示面板
- Patent Title: Thin film transistor substrate, method of manufacturing the same, and liquid crystal display panel having the same
- Patent Title (中): 薄膜晶体管基板及其制造方法以及具有该薄膜晶体管基板的液晶显示面板
-
Application No.: US14661470Application Date: 2015-03-18
-
Publication No.: US09478667B2Publication Date: 2016-10-25
- Inventor: Yeon Keon Moon , Masataka Kano , Sung-Hoon Yang , Ji Hun Lim , So Young Koo , Myoung Hwa Kim , Jun Hyung Lim
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin, Gyeonggi-Do
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Yongin, Gyeonggi-Do
- Agency: Lee & Morse P.C.
- Priority: KR10-2014-0153779 20141106
- Main IPC: G02F1/136
- IPC: G02F1/136 ; G02F1/1333 ; H01L29/786 ; H01L29/66 ; G02F1/1368

Abstract:
A thin film transistor substrate includes a substrate, a bottom gate on the substrate, a first insulating layer on the substrate and on the bottom gate, a drain on the first insulating layer, a source on the first insulating layer, the source including a first source at a first side of the drain and a second source at a second side of the drain, an active layer on the first insulating layer, the active layer including a first active layer contacting the drain and the first source and a second active layer contacting the drain and the second source, a second insulating layer on the drain, the source, and the active layer, and a top gate on the second insulating layer.
Public/Granted literature
Information query
IPC分类: