Invention Grant
- Patent Title: Excimer gas purification
- Patent Title (中): 准分子气体净化
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Application No.: US14868535Application Date: 2015-09-29
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Publication No.: US09478934B1Publication Date: 2016-10-25
- Inventor: Adam Donaldson , Edward S. Williams , John H. Hunter , Tekai Akuetteh , Ian J. Miller
- Applicant: LightMachinery Inc.
- Applicant Address: CA Nepean
- Assignee: LightMachinery Inc.
- Current Assignee: LightMachinery Inc.
- Current Assignee Address: CA Nepean
- Agency: Teitelbaum & MacLean
- Agent Neil Teitelbaum; Doug MacLean
- Main IPC: H01S3/13
- IPC: H01S3/13 ; H01S3/225

Abstract:
The disclosure relates to the removal of hydrogen fluoride (HF) from an excimer laser either in operation or in standby using a metal halide salt reactor. Removal of HF is desirable because the contaminant not only absorbs laser emission, thus reducing laser power, but it is also chemically reactive, and degrades the lifetime of internal laser components. The metal halide salt reactor may be provided either in the laser vessel or in an external conduit loop.
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