Invention Grant
US09482953B2 Lithography apparatus having effective thermal electron enhancement unit and method of forming pattern using the same
有权
具有有效的热电子增强单元的平版印刷设备和使用其形成图案的方法
- Patent Title: Lithography apparatus having effective thermal electron enhancement unit and method of forming pattern using the same
- Patent Title (中): 具有有效的热电子增强单元的平版印刷设备和使用其形成图案的方法
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Application No.: US14177278Application Date: 2014-02-11
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Publication No.: US09482953B2Publication Date: 2016-11-01
- Inventor: Cha-Won Koh , Jeon-Il Lee , Su-Min Kim , Hyun-Woo Kim , Jin Park
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-Si, Gyeonggi-Do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-Si, Gyeonggi-Do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2013-0050906 20130506
- Main IPC: G03B27/68
- IPC: G03B27/68 ; G03F7/20 ; G03F7/00
Abstract:
A lithography apparatus and a method of using the same, the apparatus including a stage for accommodating a substrate that has a photoresist film thereon; a main unit on the stage, the main unit being configured to irradiate a projection beam to the photoresist film; and an electric field unit adjacent to the stage, the electric field unit being configured to apply an electric field to the photoresist film, wherein the electric field unit is configured to be turned on at a same time as or before irradiation of the projection beam, and is configured to be turned off at a same time as or after termination of the projection beam.
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