Invention Grant
- Patent Title: Semiconductor device
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Application No.: US14930081Application Date: 2015-11-02
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Publication No.: US09484467B2Publication Date: 2016-11-01
- Inventor: Shunpei Yamazaki , Kiyoshi Kato , Masakazu Murakami
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office
- Agent Eric J. Robinson
- Priority: JP2012-022514 20120203; JP2012-058036 20120314
- Main IPC: H01L21/34
- IPC: H01L21/34 ; H01L29/24 ; H01L29/786 ; H01L29/417 ; H01L29/423 ; H01L29/45

Abstract:
A semiconductor device with significantly low off-state current is provided. An oxide semiconductor material in which holes have a larger effective mass than electrons is used. A transistor is provided which includes a gate electrode layer, a gate insulating layer, an oxide semiconductor layer including a hole whose effective mass is 5 or more times, preferably 10 or more times, further preferably 20 or more times that of an electron in the oxide semiconductor layer, a source electrode layer in contact with the oxide semiconductor layer, and a drain electrode layer in contact with the oxide semiconductor layer.
Public/Granted literature
- US20160056298A1 SEMICONDUCTOR DEVICE Public/Granted day:2016-02-25
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