Invention Grant
- Patent Title: Method for manufacturing SiC powders with high purity
- Patent Title (中): 制造高纯度SiC粉末的方法
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Application No.: US13826521Application Date: 2013-03-14
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Publication No.: US09487405B2Publication Date: 2016-11-08
- Inventor: Sang Whan Park , Kyoung Sop Han , Sung Ho Yun , Jin Oh Yang , Gyoung Sun Cho , Mi Rae Youm , Yung Chul Jo
- Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
- Applicant Address: KR Seoul
- Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee Address: KR Seoul
- Priority: KR10-2012-0025947 20120314
- Main IPC: C01B31/36
- IPC: C01B31/36

Abstract:
Disclosed herein is a method for manufacturing SiC powders with a high purity, and more particularly, a method for manufacturing SiC powders with a high purity by reating a solid phase carbon source as raw materials with gas phase silicon sources generated from a starting material composed of metallic silicon and silicon dioxide powders and, in which it is easy to control the size and crystalline phase of the SiC powders by changing the compositions of the gas phase silicon source to the solid phase carbon source mole ratio, and the temperature and time for the heat treatment.
Public/Granted literature
- US20130243682A1 METHOD FOR MANUFACTURING SiC POWDERS WITH HIGH PURITY Public/Granted day:2013-09-19
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