Invention Grant
US09488917B2 Mask and fabrication method thereof, and method of patterning by using mask
有权
掩模及其制造方法以及使用掩模进行图案化的方法
- Patent Title: Mask and fabrication method thereof, and method of patterning by using mask
- Patent Title (中): 掩模及其制造方法以及使用掩模进行图案化的方法
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Application No.: US14769713Application Date: 2015-03-16
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Publication No.: US09488917B2Publication Date: 2016-11-08
- Inventor: Dawei Shi , Hongliang Liu
- Applicant: BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Beijing CN Bejing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.,BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.,BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Beijing CN Bejing
- Agency: Ladas & Parry LLP
- Priority: CN201410589976 20141028
- International Application: PCT/CN2015/074301 WO 20150316
- International Announcement: WO2016/065799 WO 20160506
- Main IPC: G03F1/50
- IPC: G03F1/50 ; G03F7/20 ; G02F1/1343

Abstract:
Embodiments of the present disclosure provide a mask and a fabrication method thereof, and a method of patterning by using a mask. The mask comprises: a first substrate and a second substrate disposed oppositely; a liquid crystal layer located between the first substrate and the second substrate; a transparent conductive layer formed on the first substrate, the transparent conductive layer and the liquid crystal layer being located on a same side of the first substrate; and a mask pattern made of a non-transparent conductive material formed on the second substrate, wherein the mask pattern and the transparent electrode are configured to be capable of generating an electric field therebetween, so as to drive liquid crystal molecules in the liquid crystal layer to deflect.
Public/Granted literature
- US20160252817A1 MASK AND FABRICATION METHOD THEREOF, AND METHOD OF PATTERNING BY USING MASK Public/Granted day:2016-09-01
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