Invention Grant
US09488917B2 Mask and fabrication method thereof, and method of patterning by using mask 有权
掩模及其制造方法以及使用掩模进行图案化的方法

Mask and fabrication method thereof, and method of patterning by using mask
Abstract:
Embodiments of the present disclosure provide a mask and a fabrication method thereof, and a method of patterning by using a mask. The mask comprises: a first substrate and a second substrate disposed oppositely; a liquid crystal layer located between the first substrate and the second substrate; a transparent conductive layer formed on the first substrate, the transparent conductive layer and the liquid crystal layer being located on a same side of the first substrate; and a mask pattern made of a non-transparent conductive material formed on the second substrate, wherein the mask pattern and the transparent electrode are configured to be capable of generating an electric field therebetween, so as to drive liquid crystal molecules in the liquid crystal layer to deflect.
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