Invention Grant
US09496119B1 E-beam inspection apparatus and method of using the same on various integrated circuit chips 有权
电子束检查装置及其在各种集成电路芯片上的使用方法

E-beam inspection apparatus and method of using the same on various integrated circuit chips
Abstract:
The present invention discloses an e-beam inspection tool, and an apparatus for detecting defects. In one aspect is described an apparatus for detecting defects that includes a dual-deflection system that moves the e-beam over the integrated circuit to each of the plurality of predetermined locations, the dual deflection system including a magnetic deflection component that provides by magnetic deflection for movement of the e-beam through a plurality of areas on the integrated circuit and an electrostatic deflection component that provides by electrostatic deflection for movement of the e-beam within each of the plurality of areas.
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