发明授权
- 专利标题: Photoelectric conversion device and method for manufacturing photoelectric conversion device
- 专利标题(中): 光电转换装置及其制造方法
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申请号: US14436075申请日: 2013-10-10
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公开(公告)号: US09496433B2公开(公告)日: 2016-11-15
- 发明人: Takuji Maekawa , Shigeru Niki , Shogo Ishizuka , Hajime Shibata
- 申请人: ROHM CO., LTD. , National Institute of Advanced Industrial Science and Technology
- 申请人地址: JP Kyoto JP Tokyo
- 专利权人: ROHM CO., LTD.,NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- 当前专利权人: ROHM CO., LTD.,NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- 当前专利权人地址: JP Kyoto JP Tokyo
- 代理机构: Rabin & Berdo, P.C.
- 优先权: JP2012-229142 20121016
- 国际申请: PCT/JP2013/077648 WO 20131010
- 国际公布: WO2014/061561 WO 20140424
- 主分类号: H01L31/0272
- IPC分类号: H01L31/0272 ; H01L31/065 ; C23C14/34 ; H01L31/032 ; H01L31/10 ; H01L31/0224 ; H01L31/0392 ; H01L27/146 ; H01L31/18
摘要:
The inventive photoelectric conversion device includes a substrate, a lower electrode layer provided on the substrate, a CIGS compound semiconductor layer provided on the lower electrode layer as covering the lower electrode layer, and a transparent electrode layer provided on the compound semiconductor layer, wherein the compound semiconductor layer has a maximum Ga content variation of not less than 5% as measured in a layer thickness direction, and a maximum In content variation of not less than 6% as measured in the layer thickness direction.
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