发明授权
US09502224B2 Magnetron sputtering target and method for manufacturing the same 有权
磁控溅射靶及其制造方法

Magnetron sputtering target and method for manufacturing the same
摘要:
Provided is a magnetron sputtering target having a ferromagnetic metal element. This magnetron sputtering target includes: a magnetic phase containing the ferromagnetic metal element; a plurality of non-magnetic phases that each contain the ferromagnetic metal element and that are different in constituent elements or a content ratio of constituent elements; and an oxide phase. At least one of the plurality of non-magnetic phases is more finely interdispersed with the oxide phase than the magnetic phase.
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