Invention Grant
- Patent Title: Acoustic wave element and acoustic wave device using same
- Patent Title (中): 使用声波元件和声波装置
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Application No.: US13878116Application Date: 2011-12-22
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Publication No.: US09503049B2Publication Date: 2016-11-22
- Inventor: Junya Nishii , Tetsuya Kishino , Hiroyuki Tanaka , Kyohei Kobayashi , Kenji Yamamoto , Masahisa Shimozono , Takanori Ikuta , Michiaki Nishimura
- Applicant: Junya Nishii , Tetsuya Kishino , Hiroyuki Tanaka , Kyohei Kobayashi , Kenji Yamamoto , Masahisa Shimozono , Takanori Ikuta , Michiaki Nishimura
- Applicant Address: JP Kyoto-shi, Kyoto
- Assignee: KYOCERA CORPORATION
- Current Assignee: KYOCERA CORPORATION
- Current Assignee Address: JP Kyoto-shi, Kyoto
- Agency: Procopio Cory Hargreaves and Savitch LLP
- Priority: JP2010-294051 20101228; JP2011-121628 20110531
- International Application: PCT/JP2011/079865 WO 20111222
- International Announcement: WO2012/090873 WO 20120705
- Main IPC: H03H9/25
- IPC: H03H9/25 ; H03H9/145 ; H03H9/64

Abstract:
A SAW element has a substrate; an IDT electrode located on an upper surface of the substrate and comprises Al or an alloy containing Al; a first film located on an upper surface of the IDT electrode; and a protective layer which covers the IDT electrode provided with the first film and the portion of the substrate exposed from the IDT electrode, which has a thickness from the upper surface of the substrate larger than a total thickness of the IDT electrode and first film, and which contains a silicon oxide. The first film contains a material which has a larger acoustic impedance than the material (Al or the alloy containing Al) of the IDT electrode and the silicon oxide and which has a slower propagation velocity of an acoustic wave than the material of the IDT electrode and the silicon oxide.
Public/Granted literature
- US20130207747A1 ACOUSTIC WAVE ELEMENT AND ACOUSTIC WAVE DEVICE USING SAME Public/Granted day:2013-08-15
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