Invention Grant
US09505624B2 Metal-free CVD coating of graphene on glass and other dielectric substrates
有权
石墨烯在玻璃和其他电介质基材上无金属CVD涂层
- Patent Title: Metal-free CVD coating of graphene on glass and other dielectric substrates
- Patent Title (中): 石墨烯在玻璃和其他电介质基材上无金属CVD涂层
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Application No.: US14182819Application Date: 2014-02-18
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Publication No.: US09505624B2Publication Date: 2016-11-29
- Inventor: Xinyuan Liu , Robert George Manley , Robert Michael Morena , Zhen Song
- Applicant: Corning Incorporated
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Agent Zachary J. Wegmann
- Main IPC: C01B31/04
- IPC: C01B31/04 ; H01L21/00
Abstract:
A catalyst-free CVD method for forming graphene. The method involves placing a substrate within a reaction chamber, heating the substrate to a temperature between 600° C. and 1100° C., and introducing a carbon precursor into the chamber to form a graphene layer on a surface of the substrate. The method does not use plasma or a metal catalyst to form the graphene.
Public/Granted literature
- US20150232343A1 METAL-FREE CVD COATING OF GRAPHENE ON GLASS AND OTHER DIELECTRIC SUBSTRATES Public/Granted day:2015-08-20
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