发明授权
- 专利标题: Integrated composite perovskite oxide heterostructure
- 专利标题(中): 综合复合钙钛矿氧化物异质结构
-
申请号: US14488771申请日: 2014-09-17
-
公开(公告)号: US09506153B2公开(公告)日: 2016-11-29
- 发明人: Melanie Will-Cole
- 申请人: U.S. Army Research Laboratory ATTN: RDRL-LOC-I
- 申请人地址: US DC Washington
- 专利权人: The United States of America as represented by the Secretary of the Army
- 当前专利权人: The United States of America as represented by the Secretary of the Army
- 当前专利权人地址: US DC Washington
- 代理商 Christos S. Kyriakou
- 主分类号: H01L21/02
- IPC分类号: H01L21/02 ; C23C28/04 ; C23C14/34 ; C23C14/08 ; C04B41/50
摘要:
An integrated heterostructure material is achieved by combining the attributes of two perovskite oxide film growth methods, RF sputtering and the metallo-organic solution deposition (MOSD) technique, in combination with employing a novel integrated material design consisting of a SrTO3 thin film layer which serves as a template to achieve a property enhanced, BST-based thin film overgrowth. In specific the integrated materials design consists of a thin RF sputtered SrTiO3 film (lower layer) which underlies a substantially thicker MOSD over-growth Mg doped BST-based film (upper layer). The inventive material design and combinational film growth fabrication method thereof enables beneficial critical material/device characteristics which include enhanced dielectric permittivity in concert with low loss; low leakage current density; high voltage breakdown strength; high tunability; controlled and optimized film microstructure; and a smooth surface morphology with minimal surface defects. The invention enables miniature highly (voltage) tunable frequency agile devices and/or charge mediated voltage controlled magnetic devices for RF/microwave communications, RADAR, and electronic warfare applications.
公开/授权文献
- US20160076152A1 INTEGRATED COMPOSITE PEROVSKITE OXIDE HETEROSTRUCTURE 公开/授权日:2016-03-17
信息查询
IPC分类: