Invention Grant
US09507263B2 Underlay film composition for imprints and method of forming pattern and pattern formation method using the same
有权
用于印记的底层膜组合物和使用其形成图案和图案形成方法的方法
- Patent Title: Underlay film composition for imprints and method of forming pattern and pattern formation method using the same
- Patent Title (中): 用于印记的底层膜组合物和使用其形成图案和图案形成方法的方法
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Application No.: US14245491Application Date: 2014-04-04
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Publication No.: US09507263B2Publication Date: 2016-11-29
- Inventor: Kunihiko Kodama , Shinji Tarutani , Yuichiro Enomoto , Tadashi Oomatsu , Takayuki Ito , Hirotaka Kitagawa , Akiko Hattori
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2011-223031 20111007; JP2012-193857 20120904
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/09
Abstract:
Provided is the pattern formability and line edge roughness of the resultant substrate.An underlay film composition for imprints comprising a compound (A) and a solvent (B), the compound (A) having at least either one of a group (Ka) capable of covalently bonding and/or interacting with a substrate, and, a group (Kb) capable of covalently bonding and/or interacting with a curable composition for imprints, an Ohnishi parameter (Z) calculated from (equation 1) of 3.8 or larger, and a molecular weight of 400 or larger: the Ohnishi parameter=(total number of atoms)/(number of carbon atoms−number of oxygen atoms). (Equation 1)
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