公开(公告)号：US09796803B2

公开(公告)日：2017-10-24

申请号：US14549068

申请日：2014-11-20

Applicant: FUJIFILM Corporation

Inventor： Hirotaka Kitagawa ,  Akiko Hattori ,  Yuichiro Enomoto

IPC: C08F220/32 ,  G03F7/00 ,  B29C59/00 ,  C08F220/18 ,  C08F220/28 ,  H01L21/02 ,  B29K33/00

CPC classification number: C08F220/32 ,  B29C59/005 ,  B29K2033/12 ,  C08F220/18 ,  C08F220/28 ,  C08F2220/281 ,  C08F2220/325 ,  G03F7/0002 ,  H01L21/02356

Abstract: An under layer film having excellent surface planarity is provided. In one aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A) containing an ethylenic unsaturated group (P) and a nonionic hydrophilic group (Q), and having a weight average molecular weight of 1,000 or larger; and a solvent (B), the resin (A) having an acid value of smaller than 1.0 mmol/g. In another aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A2) containing an ethylenic unsaturated group (P), and containing, as a nonionic hydrophilic group (Q), a cyclic substituent (Q2) having a carbonyl group in the cyclic structure thereof, with a weight average molecular weight of 1,000 or larger; and a solvent (B).

公开(公告)号：US08753802B2

公开(公告)日：2014-06-17

申请号：US13656960

申请日：2012-10-22

Applicant: FUJIFILM Corporation

Inventor： Keita Kato ,  Shinji Tarutani ,  Sou Kamimura ,  Yuichiro Enomoto ,  Kaoru Iwato

IPC: G03F7/26

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/2041 ,  G03F7/325

Abstract: A pattern forming method comprising: (i) a step of forming a film from a chemical amplification resist composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the resist composition contains: (A) a resin, (B) a nonionic compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a crosslinking agent, and (D) a solvent.

Abstract translation: 一种图案形成方法，包括：（i）从化学放大抗蚀剂组合物形成膜的步骤，（ii）曝光所述膜的步骤，和（iii）通过使用含有机溶剂的显影膜的步骤 显影剂，其中抗蚀剂组合物包含：（A）树脂，（B）在用光化射线或辐射照射时能够产生酸的非离子化合物，（C）交联剂和（D）溶剂。

公开(公告)号：US10344177B2

公开(公告)日：2019-07-09

申请号：US14860767

申请日：2015-09-22

Applicant: FUJIFILM Corporation

Inventor： Hirotaka Kitagawa ,  Yuichiro Enomoto

IPC: C09D151/08 ,  G03F7/00 ,  G03F7/038 ,  G03F7/11 ,  B29C59/00 ,  C09D151/00 ,  B29K63/00 ,  B29K96/02

Abstract: Provided is a composition for forming underlying layer for imprints, which is excellent in surface flatness and adhesiveness. The composition for forming underlying layer for imprints comprises (A) a resin having an ethylenic unsaturated group (P), and a cyclic ether group (T) selected from oxiranyl group and oxetanyl group, and having a weight-average molecular weight of 1000 or larger; and, (B) a solvent.

公开(公告)号：US09507263B2

公开(公告)日：2016-11-29

申请号：US14245491

申请日：2014-04-04

Applicant: FUJIFILM Corporation

Inventor： Kunihiko Kodama ,  Shinji Tarutani ,  Yuichiro Enomoto ,  Tadashi Oomatsu ,  Takayuki Ito ,  Hirotaka Kitagawa ,  Akiko Hattori

IPC: G03F7/00 ,  G03F7/09

CPC classification number: G03F7/094 ,  G03F7/0002 ,  Y10T428/31504

Abstract: Provided is the pattern formability and line edge roughness of the resultant substrate.An underlay film composition for imprints comprising a compound (A) and a solvent (B), the compound (A) having at least either one of a group (Ka) capable of covalently bonding and/or interacting with a substrate, and, a group (Kb) capable of covalently bonding and/or interacting with a curable composition for imprints, an Ohnishi parameter (Z) calculated from (equation 1) of 3.8 or larger, and a molecular weight of 400 or larger: the Ohnishi parameter=(total number of atoms)/(number of carbon atoms−number of oxygen atoms).  (Equation 1)

公开(公告)号：US20160122563A1

公开(公告)日：2016-05-05

申请号：US14757424

申请日：2015-12-23

Applicant: FUJIFILM Corporation

Inventor： Yuichiro Goto ,  Tadashi Oomatsu ,  Hirotaka Kitagawa ,  Yuichiro Enomoto ,  Kenichi Kodama

IPC: C09D11/30 ,  B41J2/01 ,  C09D11/106

CPC classification number: C09D11/30 ,  B41J2/01 ,  C08G65/007 ,  C08G65/3322 ,  C08K5/06 ,  C08K5/103 ,  C08K5/12 ,  C09D11/101 ,  C09D11/106 ,  C09D11/38 ,  C09D133/06 ,  G03F7/0002

Abstract: The present invention provides a discharge method which makes it possible to appropriately perform discharge even when a head for discharging microdroplets having a size of equal to or less than 6 pL that is necessary for controlling a residual film (forming a thin film and achieving uniformity) is used, and makes it possible to obtain an excellent pattern having excellent release properties. The discharge method is an inkjet discharge method including discharging a photocurable composition in the form of liquid droplets having a size of equal to or less than 6 pL, in which the composition satisfies the following (a) to (c), (a) containing a fluorine-containing material in a proportion of equal to or less than 4% by mass of the composition; (b) having a surface tension of 25 mN/m to 35 mN/m; and (c) containing a solvent having a boiling point of equal to or less than 200° C. in an amount of 5% by mass of the composition.

Abstract translation: 本发明提供了一种排出方法，即使用于排出具有等于或小于6pL的尺寸的微滴的头部（即形成薄膜并实现均匀性）所需的位置也可适当地进行放电， ，并且可以获得具有优异的剥离性能的优异图案。 放电方法是喷墨放电方法，包括以等于或小于6pL的液滴的形式排出光固化组合物，其中组合物满足以下（a）至（c），（a） 比例为组合物质量的4质量％以下的含氟材料; （b）表面张力为25mN / m至35mN / m; 和（c）以组合物的5质量％的量含有沸点等于或小于200℃的溶剂。

公开(公告)号：US09263289B2

公开(公告)日：2016-02-16

申请号：US14550473

申请日：2014-11-21

Applicant: FUJIFILM CORPORATION

Inventor： Akiko Hattori ,  Hirotaka Kitagawa ,  Yuichiro Enomoto

IPC: C08G59/00 ,  H01L21/308 ,  C08F299/02 ,  G03F7/00 ,  C09J163/10 ,  G03F7/038

CPC classification number: H01L21/3086 ,  C08F299/02 ,  C09J163/10 ,  G03F7/0002 ,  G03F7/0388 ,  H01L21/3088 ,  H01L2924/0002 ,  Y10T428/24802 ,  H01L2924/00

Abstract: Provided is an adhesion-promoting composition between a curable composition for imprints and a substrate, which excellent in adhesiveness and can control pattern failure. An adhesion-promoting composition used between a curable composition for imprints and a substrate, which comprises a compound having a molecular weight of 500 or larger and having a reactive group, and has a content of a compound, with a molecular weight of 200 or smaller, of more than 1% by mass and not more than 10% by mass of a total solid content.

Abstract translation: 提供了一种用于印记的可固化组合物和基材之间的粘合促进组合物，其粘合性优异并且可以控制图案破坏。 在用于印记的可固化组合物和基材之间使用的粘合促进组合物，其包含分子量为500以上并具有反应性基团的化合物，并且具有分子量为200以下的化合物 ，超过总固体含量的1质量％且不超过10质量％。

公开(公告)号：US09868846B2

公开(公告)日：2018-01-16

申请号：US14151367

申请日：2014-01-09

Applicant: FUJIFILM Corporation

Inventor： Kunihiko Kodama ,  Yuichiro Enomoto ,  Kazuyuki Usuki ,  Tadashi Omatsu ,  Hirotaka Kitagawa

IPC: C08K5/053 ,  C08F220/22 ,  C08F222/10 ,  G11B5/855 ,  B29C59/00 ,  C08F2/48 ,  C08F220/10 ,  C09D4/06 ,  C08F2/46 ,  C08F220/18 ,  C08F230/08 ,  C08F220/38

CPC classification number: C08K5/053 ,  B29C59/005 ,  C08F2/46 ,  C08F2/48 ,  C08F220/10 ,  C08F220/22 ,  C08F222/1006 ,  C08F230/08 ,  C08F2220/1833 ,  C08F2220/185 ,  C08F2220/1875 ,  C08F2220/1891 ,  C08F2220/382 ,  C08F2222/1013 ,  C08F2222/102 ,  C09D4/06 ,  G11B5/855 ,  Y10T428/24479 ,  C09D133/04 ,  C08L71/02

Abstract: Disclosed is a to provide a curable composition for imprints capable of keeping a good patternability and of producing less defects even after repetitive pattern transfer. The curable composition for imprints comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a non-polymerizable compound (C) having a polyalkylene glycol structure having at least one terminal hydroxy group, or at least one etherified terminal hydroxy group, and containing substantially no fluorine atom and no silicon atom.

公开(公告)号：US10175576B2

公开(公告)日：2019-01-08

申请号：US14643512

申请日：2015-03-10

Applicant: FUJIFILM Corporation

Inventor： Hirotaka Kitagawa ,  Yuichiro Goto ,  Yuichiro Enomoto

IPC: G03F7/00 ,  G03F7/031 ,  C08F2/44 ,  C08F2/48 ,  G03F7/004 ,  G03F7/027 ,  G03F7/038 ,  C09D11/101 ,  C09D11/30 ,  H01L21/308

Abstract: Provided is a curable composition for photo imprints excellent in the mold releasability and the ink jettability. The curable composition for photo imprints, comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a mold releasing agent (C), the mold releasing agent (C) being represented by the formula (I) below. Rf represents a C1-8 fluorine-containing alkyl group having two or more fluorine atoms; m represents 1 or 2; L represents a single bond or divalent linking group; n represents 1 or 2; X represents a single bond, oxygen atom, sulfur atom, or nitrogen atom; R1 represents a C1-8 substituent being free from a polymerizable group; R2 represents a hydrogen atom, C1-8 substituent, or divalent linking group; p represents 1 or 2, q represents 0 or 1, and r represents 1 or 2; R1 and R2 may combine with each other to form a ring.

公开(公告)号：US09862847B2

公开(公告)日：2018-01-09

申请号：US14757424

申请日：2015-12-23

Applicant: FUJIFILM Corporation

Inventor： Yuichiro Goto ,  Tadashi Oomatsu ,  Hirotaka Kitagawa ,  Yuichiro Enomoto ,  Kenichi Kodama

IPC: C09D11/30 ,  B41J2/01 ,  C09D11/106 ,  G03F7/00 ,  C09D11/101 ,  C09D11/38 ,  C08G65/00 ,  C08G65/332 ,  C09D133/06 ,  C08K5/06 ,  C08K5/103 ,  C08K5/12

CPC classification number: C09D11/30 ,  B41J2/01 ,  C08G65/007 ,  C08G65/3322 ,  C08K5/06 ,  C08K5/103 ,  C08K5/12 ,  C09D11/101 ,  C09D11/106 ,  C09D11/38 ,  C09D133/06 ,  G03F7/0002

Abstract: The present invention provides a discharge method which makes it possible to appropriately perform discharge even when a head for discharging microdroplets having a size of equal to or less than 6 pL that is necessary for controlling a residual film (forming a thin film and achieving uniformity) is used, and makes it possible to obtain an excellent pattern having excellent release properties. The discharge method is an inkjet discharge method including discharging a photocurable composition in the form of liquid droplets having a size of equal to or less than 6 pL, in which the composition satisfies the following (a) to (c), (a) containing a fluorine-containing material in a proportion of equal to or less than 4% by mass of the composition; (b) having a surface tension of 25 mN/m to 35 mN/m; and (c) containing a solvent having a boiling point of equal to or less than 200° C. in an amount of 5% by mass of the composition.

公开(公告)号：US09482958B2

公开(公告)日：2016-11-01

申请号：US14749035

申请日：2015-06-24

Applicant: FUJIFILM Corporation

Inventor： Yuichiro Enomoto ,  Shinji Tarutani ,  Sou Kamimura ,  Kaoru Iwato ,  Keita Kato ,  Kana Fujii

IPC: G03F7/20 ,  G03F7/42 ,  G03F7/038 ,  G03F7/039 ,  G03F7/32 ,  G03F7/004

CPC classification number: G03F7/325 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/422

Abstract: Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer.