Invention Grant
US09508527B2 Sample base, charged particle beam device and sample observation method
有权
样品基质，带电粒子束装置和样品观察方法
- Patent Title: Sample base, charged particle beam device and sample observation method
- Patent Title (中): 样品基质，带电粒子束装置和样品观察方法
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Application No.: US14646159Application Date: 2013-11-26
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Publication No.: US09508527B2Publication Date: 2016-11-29
- Inventor: Yusuke Ominami , Takashi Ohshima , Sukehiro Ito
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2012-257030 20121126
- International Application: PCT/JP2013/081793 WO 20131126
- International Announcement: WO2014/081040 WO 20140530
- Main IPC: H01J37/26
- IPC: H01J37/26 ; H01J37/16 ; H01J37/28 ; H01J37/20 ; H01J37/244 ; H01J37/22 ; H01J37/18
Abstract:
This charged particle beam device irradiates a primary charged particle beam generated from a charged particle microscope onto a sample arranged on a light-emitting member that makes up at least a part of a sample base, and, in addition to obtaining charged particle microscope images by the light-emitting member detecting charged particles transmitted through or scattered inside the sample, obtains optical microscope images by means of an optical microscope while the sample is still arranged on the sample platform.
Public/Granted literature
- US20150318143A1 Sample Base, Charged Particle Beam Device and Sample Observation Method Public/Granted day:2015-11-05
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