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US09508667B2 Formation of solder and copper interconnect structures and associated techniques and configurations 有权
形成焊料和铜互连结构及相关技术和配置

Formation of solder and copper interconnect structures and associated techniques and configurations
Abstract:
Embodiments of the present disclosure are directed toward formation of solder and copper interconnect structures and associated techniques and configurations. In one embodiment, a method includes providing an integrated circuit (IC) substrate and depositing a solderable material on the IC substrate using an ink deposition process, a binder printing system, or a powder laser sintering system. In another embodiment, a method includes providing an integrated circuit (IC) substrate and depositing a copper powder on the IC substrate using an additive process to form a copper interconnect structure. Other embodiments may be described and/or claimed.
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