Invention Grant
US09508794B2 Mixed N/P-type fin semiconductor structure with epitaxial materials having increased surface area through multiple epitaxial heads 有权
具有通过多个外延头增加表面积的外延材料的混合N / P型鳍式半导体结构

Mixed N/P-type fin semiconductor structure with epitaxial materials having increased surface area through multiple epitaxial heads
Abstract:
A non-planar semiconductor structure includes mixed n-and-p type raised semiconductor structures, e.g., fins, having epitaxial structures grown on top surfaces thereof, for example, epitaxial silicon and silicon germanium, naturally growing into a diamond shape. The surface area of the epitaxial structures is increased by removing portion(s) thereof, masking each type as the other type is grown and then subsequently modified by the removal. The removal may create multi-head (e.g., dual-head) epitaxial structures, together with the neck of the respective raised structure resembling a Y-shape.
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