Invention Grant
US09508794B2 Mixed N/P-type fin semiconductor structure with epitaxial materials having increased surface area through multiple epitaxial heads
有权
具有通过多个外延头增加表面积的外延材料的混合N / P型鳍式半导体结构
- Patent Title: Mixed N/P-type fin semiconductor structure with epitaxial materials having increased surface area through multiple epitaxial heads
- Patent Title (中): 具有通过多个外延头增加表面积的外延材料的混合N / P型鳍式半导体结构
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Application No.: US15002000Application Date: 2016-01-20
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Publication No.: US09508794B2Publication Date: 2016-11-29
- Inventor: Xusheng Wu , Changyong Xiao , Xiang Hu , Wanxun He
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: Heslin Rothenberg Farley & Mesiti P.C.
- Agent Wayne F. Reinke, Esq.
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L27/092 ; H01L21/8238 ; H01L29/16 ; H01L29/161 ; H01L29/201 ; H01L21/02 ; H01L21/306 ; H01L29/20

Abstract:
A non-planar semiconductor structure includes mixed n-and-p type raised semiconductor structures, e.g., fins, having epitaxial structures grown on top surfaces thereof, for example, epitaxial silicon and silicon germanium, naturally growing into a diamond shape. The surface area of the epitaxial structures is increased by removing portion(s) thereof, masking each type as the other type is grown and then subsequently modified by the removal. The removal may create multi-head (e.g., dual-head) epitaxial structures, together with the neck of the respective raised structure resembling a Y-shape.
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