Invention Grant
- Patent Title: Lithographic apparatus
- Patent Title (中): 平版印刷设备
-
Application No.: US14411870Application Date: 2013-06-05
-
Publication No.: US09513568B2Publication Date: 2016-12-06
- Inventor: Jan Steven Christiaan Westerlaken , Ruud Hendrikus Martinus Johannes Bloks , Peter A. Delmastro , Thibault Simon Mathieu Laurent , Martinus Hendrikus Antonius Leenders , Mark Josef Schuster , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Justin Matthew Verdirame , Samir A. Nayfeh
- Applicant: ASML Netherlands B.V. , ASML Holding N.V.
- Applicant Address: NL Veldhoven NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.,ASML HOLDING N.V.
- Current Assignee: ASML NETHERLANDS B.V.,ASML HOLDING N.V.
- Current Assignee Address: NL Veldhoven NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2013/061560 WO 20130605
- International Announcement: WO2014/005780 WO 20140109
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03F7/20
Abstract:
A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.
Public/Granted literature
- US20150168854A1 LITHOGRAPHIC APPARATUS Public/Granted day:2015-06-18
Information query
