Invention Grant
US09516729B2 Variable radius mirror dichroic beam splitter module for extreme ultraviolet source
有权
用于极紫外光源的可变半径反射镜二向色光束分离器模块
- Patent Title: Variable radius mirror dichroic beam splitter module for extreme ultraviolet source
- Patent Title (中): 用于极紫外光源的可变半径反射镜二向色光束分离器模块
-
Application No.: US14804976Application Date: 2015-07-21
-
Publication No.: US09516729B2Publication Date: 2016-12-06
- Inventor: Kevin W Zhang , Michael Purvis , Robert J Rafac , Alexander Schafgans
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G02B27/14 ; G02B26/08 ; G01J11/00
Abstract:
A laser produced plasma extreme ultraviolet laser source comprising at least one variable radius mirror. The at least one variable radius mirror to adjust a beam diameter of a main pulse at a specified distance from a pre-pulse focal plane, where the pre-pulse radiates droplets into target droplets and the main pulse radiates the target droplets into a plasma state to generate the extreme ultraviolet radiation.
Public/Granted literature
- US20160174351A1 Variable Radius Mirror Dichroic Beam Splitter Module for Extreme Ultraviolet Source Public/Granted day:2016-06-16
Information query
