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1.发明授权Variable radius mirror dichroic beam splitter module for extreme ultraviolet source 有权用于极紫外光源的可变半径反射镜二向色光束分离器模块公开(公告)号：US09516729B2
公开(公告)日：2016-12-06
申请号：US14804976
申请日：2015-07-21
Applicant: ASML Netherlands B.V.
Inventor： Kevin W Zhang , Michael Purvis , Robert J Rafac , Alexander Schafgans
CPC classification number: H05G2/003 , G01J11/00 , G02B26/0825 , G02B27/141 , H05G2/005 , H05G2/008
Abstract: A laser produced plasma extreme ultraviolet laser source comprising at least one variable radius mirror. The at least one variable radius mirror to adjust a beam diameter of a main pulse at a specified distance from a pre-pulse focal plane, where the pre-pulse radiates droplets into target droplets and the main pulse radiates the target droplets into a plasma state to generate the extreme ultraviolet radiation.
Abstract translation: 激光产生包括至少一个可变半径反射镜的等离子体极紫外激光源。 所述至少一个可变半径镜，以调整与预脉冲焦平面相距规定距离处的主脉冲的光束直径，其中预脉冲将液滴辐射到目标液滴中，并且主脉冲将目标液滴辐射到等离子体状态 以产生极紫外线辐射。
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2.发明申请Variable Radius Mirror Dichroic Beam Splitter Module for Extreme Ultraviolet Source 有权用于极紫外光源的可变半径镜二向色光束分离器模块公开(公告)号：US20160174351A1
公开(公告)日：2016-06-16
申请号：US14804976
申请日：2015-07-21
Applicant: ASML Netherlands B.V.
Inventor： Kevin W. Zhang , Michael Purvis , Robert J. Rafac , Alexander Schafgans
CPC classification number: H05G2/003 , G01J11/00 , G02B26/0825 , G02B27/141 , H05G2/005 , H05G2/008
Abstract: A laser produced plasma extreme ultraviolet laser source comprising at least one variable radius mirror. The at least one variable radius mirror to adjust a beam diameter of a main pulse at a specified distance from a pre-pulse focal plane, where the pre-pulse radiates droplets into target droplets and the main pulse radiates the target droplets into a plasma state to generate the extreme ultraviolet radiation.
Abstract translation: 激光产生包括至少一个可变半径反射镜的等离子体极紫外激光源。 所述至少一个可变半径镜，以调整与预脉冲焦平面相距规定距离处的主脉冲的光束直径，其中预脉冲将液滴辐射到目标液滴中，并且主脉冲将目标液滴辐射到等离子体状态 以产生极紫外线辐射。
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