Invention Grant
US09519227B2 Metrology for measurement of photosensitizer concentration within photo-sensitized chemically-amplified resist (PS-CAR)
有权
用于光敏化学增幅抗蚀剂（PS-CAR）中光敏剂浓度测量的测量
- Patent Title: Metrology for measurement of photosensitizer concentration within photo-sensitized chemically-amplified resist (PS-CAR)
- Patent Title (中): 用于光敏化学增幅抗蚀剂（PS-CAR）中光敏剂浓度测量的测量
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Application No.: US14628682Application Date: 2015-02-23
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Publication No.: US09519227B2Publication Date: 2016-12-13
- Inventor: Michael A. Carcasi , Mark H. Somervell , Joshua S. Hooge , Benjamen M. Rathsack , Seiji Nagahara
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Wood Herron & Evans LLP
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
Methods for measuring photosensitizer concentrations in a photo-sensitized chemically-amplified resist (PS-CAR) patterning process are described. Measured photosensitizer concentrations can be used in feedback and feedforward control of the patterning process and subsequent processing steps. Also described is a metrology target formed using PS-CAR resist, and a substrate including a plurality of such metrology targets to facilitate patterning process control.
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