A memory device includes: a plurality of conductive stacked structures including at least a string select line, a plurality of word lines and at least a ground select line; a plurality of memory cells formed in the conductive stacked structures; a plurality of bit lines, formed on the conductive stacked structures; and at least an odd common source line and at least an even common source line, formed on the conductive stacked structures. The odd common source line is coupled to a plurality of odd bit lines of the bit lines. The even common source line is coupled to a plurality of even bit lines of the bit lines.