Invention Grant
- Patent Title: Systems and methods for depositing and charging solar cell layers
- Patent Title (中): 太阳能电池层沉积和充电的系统和方法
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Application No.: US13954099Application Date: 2013-07-30
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Publication No.: US09520531B2Publication Date: 2016-12-13
- Inventor: Jeong-Mo Hwang
- Applicant: Amtech Systems, Inc.
- Applicant Address: US AZ Tempe
- Assignee: Amtech Systems, Inc.
- Current Assignee: Amtech Systems, Inc.
- Current Assignee Address: US AZ Tempe
- Agency: Adam R. Stephenson, Ltd.
- Main IPC: H01L31/18
- IPC: H01L31/18 ; H01J37/32 ; H01L31/0216 ; H01L31/068

Abstract:
Systems and methods of the present invention may be used to charge a layer (such as a passivation layer and/or antireflective layer) of a solar cell (e.g., wafer) with a positive or negative charge. The layer may retain the charge to improve operation of the solar cell. The charged layer may include any suitable dielectric material capable of retaining either a negative or a positive charge. Systems and methods of the present invention permit in-situ charging of a layer. Charging of a layer may be accomplished during or after deposition of the layer including after completing the whole solar cell process, in other words, on a finished cell.
Public/Granted literature
- US20140057386A1 Systems and Methods for Depositing and Charging Solar Cell Layers Public/Granted day:2014-02-27
Information query
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