Invention Grant
US09524742B2 CXNYHZ film, deposition method, magnetic recording medium and method for manufacturing the same
有权
CXNYHZ膜，沉积法，磁记录介质及其制造方法
- Patent Title: CXNYHZ film, deposition method, magnetic recording medium and method for manufacturing the same
- Patent Title (中): CXNYHZ膜，沉积法，磁记录介质及其制造方法
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Application No.: US14351661Application Date: 2011-10-24
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Publication No.: US09524742B2Publication Date: 2016-12-20
- Inventor: Haruhito Hayakawa , Kouji Abe , Keiichi Terashima , Yuuji Honda
- Applicant: Haruhito Hayakawa , Kouji Abe , Keiichi Terashima , Yuuji Honda
- Applicant Address: JP Chiba
- Assignee: YOUTEC CO., LTD.
- Current Assignee: YOUTEC CO., LTD.
- Current Assignee Address: JP Chiba
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- International Application: PCT/JP2011/074457 WO 20111024
- International Announcement: WO2013/061398 WO 20130502
- Main IPC: G11B5/66
- IPC: G11B5/66 ; G11B5/72 ; G11B5/84 ; C23C16/02 ; C23C16/34 ; C23C16/56 ; G11B5/725
Abstract:
To provide a CxNyHz film of high density and a deposition method. One aspect of the present invention is a CxNyHz film formed on a substrate to be deposited, wherein x, y and z satisfy formulae (1) to (4) below: 0.4
Public/Granted literature
- US20140349140A1 CXNYHZ FILM, DEPOSITION METHOD, MAGNETIC RECORDING MEDIUM AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2014-11-27
Information query
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