发明授权
- 专利标题： Imprint lithography
- 专利标题（中）： 印刷光刻
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申请号： US13579544申请日： 2011-01-11
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公开(公告)号： US09535322B2公开(公告)日： 2017-01-03
- 发明人: Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
- 申请人： Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 国际申请： PCT/EP2011/050246 WO 20110111
- 国际公布： WO2011/107302 WO 20110909
- 主分类号： B29C59/02
- IPC分类号： B29C59/02 ; G01B15/00 ; G03F7/00 ; B82Y10/00 ; B82Y40/00
摘要：
A method of determining a position of an imprint template in an imprint lithography apparatus. In an embodiment, the method includes illuminating an area of the imprint template in which an alignment mark is expected to be found by scanning an alignment radiation beam over that area, detecting an intensity of radiation reflected or transmitted from the area, and identifying the alignment mark via analysis of the detected intensity.
公开/授权文献
- US20120313295A1 IMPRINT LITHOGRAPHY 公开/授权日：2012-12-13
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