Invention Grant
US09541838B2 Method of temperature compensation in high power focusing system for EUV LPP source
有权
EUV LPP源高功率聚焦系统温度补偿方法
- Patent Title: Method of temperature compensation in high power focusing system for EUV LPP source
- Patent Title (中): EUV LPP源高功率聚焦系统温度补偿方法
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Application No.: US15011218Application Date: 2016-01-29
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Publication No.: US09541838B2Publication Date: 2017-01-10
- Inventor: Alexander I. Ershov
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Arent Fox LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42 ; G03F7/20
Abstract:
Method of temperature compensating a focusing system in which a temperature of a thermal lens compensation plate is regulated based on an optical absorption of the thermal lens compensation plate with optical absorption being determined based at least in part on an expected end-of-lifetime value for focus lens optical absorption. A value representative of cumulative time in use of the focusing systems is determined and the temperature of the thermal lens compensation plate is increased to a temperature based at least in part on said cumulative time in use.
Public/Granted literature
- US20160161855A1 APPARATUS FOR AND METHOD OF TEMPERATURE COMPENSATION IN HIGH POWER FOCUSING SYSTEM FOR EUV LPP SOURCE Public/Granted day:2016-06-09
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