Invention Grant
US09546995B2 Nanopore device including graphene nanopore and method of manufacturing the same
有权
包括石墨烯纳米孔的纳米孔装置及其制造方法
- Patent Title: Nanopore device including graphene nanopore and method of manufacturing the same
- Patent Title (中): 包括石墨烯纳米孔的纳米孔装置及其制造方法
-
Application No.: US14257654Application Date: 2014-04-21
-
Publication No.: US09546995B2Publication Date: 2017-01-17
- Inventor: Tae-han Jeon , Jeo-young Shim , Kun-sun Eom , Dong-ho Lee , Joo-ho Lee
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Leydig, Voit & Mayer, Ltd.
- Priority: KR10-2013-0109974 20130912
- Main IPC: G01N27/327
- IPC: G01N27/327 ; G01N27/453 ; G01N27/447 ; H01L29/66 ; H01L21/768 ; H01L29/16 ; G01N33/487 ; B81C1/00

Abstract:
Provided are a nanopore device with resolution improved by graphene nanopores, and a method of manufacturing the same. The nanopore device includes: a first insulating layer; a graphene layer disposed on the first insulating layer and having a nanopore formed at a center portion of the graphene layer; and first and second electrode layers disposed respectively at both sides of the nanopore on a top surface of the graphene layer, wherein a center region of the first insulating layer is removed such that the center portion of the graphene layer is exposed to the outside.
Public/Granted literature
- US20150069329A1 NANOPORE DEVICE INCLUDING GRAPHENE NANOPORE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2015-03-12
Information query