Invention Grant
US09548180B2 Nanoparticle-templated lithographic patterning of nanoscale electronic components
有权
纳米尺度电子元件的纳米颗粒模板平版印刷图案
- Patent Title: Nanoparticle-templated lithographic patterning of nanoscale electronic components
- Patent Title (中): 纳米尺度电子元件的纳米颗粒模板平版印刷图案
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Application No.: US14947773Application Date: 2015-11-20
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Publication No.: US09548180B2Publication Date: 2017-01-17
- Inventor: Max N. Mankin , Tony S. Pan
- Applicant: Elwha LLC
- Applicant Address: US WA Bellevue
- Assignee: ELWHA LLC
- Current Assignee: ELWHA LLC
- Current Assignee Address: US WA Bellevue
- Main IPC: H01J1/308
- IPC: H01J1/308 ; H01J9/02 ; H01J1/304 ; H01L31/0352 ; H01L21/3065
Abstract:
Some embodiments of vacuum electronics call for nanoscale field-enhancing geometries. Methods and apparatus for using nanoparticles to fabricate nanoscale field-enhancing geometries are described herein. Other embodiments of vacuum electronics call for methods of controlling spacing between a control grid and an electrode on a nano- or micron-scale, and such methods are described herein.
Public/Granted literature
- US20160181051A1 Nanoparticle-Templated Lithographic Patterning of Nanoscale Electronic Components Public/Granted day:2016-06-23
Information query
