发明授权
US09551936B2 Perfluoroalkyl sulfonamides surfactants for photoresist rinse solutions
有权
用于光刻胶冲洗溶液的全氟烷基磺酰胺表面活性剂
- 专利标题： Perfluoroalkyl sulfonamides surfactants for photoresist rinse solutions
- 专利标题（中）： 用于光刻胶冲洗溶液的全氟烷基磺酰胺表面活性剂
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申请号： US14237193申请日： 2012-08-01
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公开(公告)号： US09551936B2公开(公告)日： 2017-01-24
- 发明人: Jason M. Kehren , Patricia M. Savu , Matthew J. Pinnow
- 申请人： Jason M. Kehren , Patricia M. Savu , Matthew J. Pinnow
- 申请人地址： US MN St. Paul
- 专利权人： 3M INNOVATIVE PROPERTIES COMPANY
- 当前专利权人： 3M INNOVATIVE PROPERTIES COMPANY
- 当前专利权人地址： US MN St. Paul
- 代理商 Adam Bramwell
- 国际申请： PCT/US2012/049158 WO 20120801
- 国际公布： WO2013/022673 WO 20130214
- 主分类号： G03F7/32
- IPC分类号： G03F7/32 ; G03F7/40 ; H01L21/027
摘要：
A method of modifying a surface of a photoresist material including exposing the photoresist material to an aqueous ionic surfactant solution and varying the pH of the aqueous ionic surfactant solution until a fluorochemical layer is formed in or on the photoresist material. The aqueous ionic surfactant solution includes a perfluoroalkyl sulfonamide the formula: RfS02NH—R′ where Rf=CnF2n+1— and n=1 to 6, R′=—H, —CH3, and —CH2CH2OH. The aqueous ionic surfactant solution has a pH of within about 3 pH units of a pKa of the perfluoroalkyl sulfonamide.
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